High-k Gate Dielectrics for CMOS Technology

High-k Gate Dielectrics for CMOS Technology

Tekijä: Gang He, Zhaoqi Sun
Kustantaja: Wiley
Painos: 1
Julkaisuvuosi: 2012
ISBN: 9783527330324

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Maksa Klarnalla
14 päivän palautusoikeus
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

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